Consumables wh ShP i feedback. It is suitable for the research and development of MEMS, micro and nanoelectronic, plasmonic, photonic systems, and integrated optical devices.
A scanning electron microscope equipped with a laser interferometry stage capable of working with samples up to 50x50 mm2. Overlay and stitching accuracy below nm, linewidth below 20 nm. The DWL 66FS laser lithography system is a high-resolution pattern generator for low-volume mask-making and direct writing.
The Laurell WS B spin coater is compact and packed with advanced features. Exposure can be carried out in proximity mode or in contact mode. The MA8 is equipped with top-side optical microscopes and bottom-side microscopes, so alignment is possible from both sides of the wafer. The wetbench provides a complete basic setup for substrate coating.
The Dektak stylus surface profiler is an advanced thin and thick film step height measurement tool. In addition to profiling surface topography and waviness, the Dektak system measures roughness in the nanometer range.
Microwave plasma is ideal for most resist removal in modern device fabrication. It reduces the effects of deformation and shrinkage that occur when drying wet samples by conventional evaporation.
